Magnesium Oxide Sputtering Target
- Custom and standard options available.
- Fast lead times guaranteed.
- High performance at a competitive price.
A high-purity MgO crucible offers exceptional heat and corrosion resistance. Used in metallurgy, ceramics, and research, it excels at processing reactive metals (especially alkaline earth types) above 2000°C with minimal contamination. Though susceptible to hydration, its thermal stability and chemical inertness make it essential for advanced synthesis, precision casting, and lab analysis.NexusX Advanced Materials, as a premier manufacturer and supplier of high-quality Magnesium Oxide Sputtering Target products, focuses on producing high-precision aluminum nitride silicon structural compenents through advanced technologies for diverse application fields.
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Magnesium Oxide Sputtering Target Data Sheet
| Color: | White or yellow |
| Chemical Formula: | MgO |
| Density: | 3.20 g/cm3 |
| Dimension: | customized |
| Shape: | Disc/Rectangular/Tube or customized |
| Bonding: | Bonding/Unbonding |
Magnesium Oxide Sputtering Target Description
Magnesium Oxide Sputtering Target is a high-purity ceramic target material essential for thin film deposition processes, primarily utilized in radio frequency (RF) magnetron sputtering systems due to its insulating properties. Composed of sintered magnesium oxide (MgO) with typical purities ranging from 99.9% to 99.99%, this target is engineered to produce high-quality, stoichiometric MgO thin films characterized by excellent dielectric strength, optical transparency in the visible and near-UV range, and superior chemical and thermal stability. These films are critically employed as protective layers in AC Plasma Display Panels (PDPs), as insulating buffer layers in magnetic tunnel junctions and superconducting devices like Josephson junctions, and as anti-reflection or high-index coatings in optical applications. Our MgO targets are manufactured through advanced ceramic processing techniques to ensure high density, minimal porosity, and exceptional microstructural uniformity, which are paramount for achieving consistent deposition rates, stable plasma conditions, and defect-free film morphology. Available in various standard and custom dimensions, bonding options, and purity grades, our Magnesium Oxide Sputtering Target is designed to meet the stringent demands of research, semiconductor, and advanced display manufacturing industries, providing reliable performance for cutting-edge electronic and optical thin film applications.
Magnesium Oxide Sputtering Target Specifications
| Circular Sputtering Targets | Diameter | 1.0”, 2.0”, 3.0”, 4.0”, 5.0”, 6.0” up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”, 5” x 15”, 5” x 20”, 5” x 22”, 6” x 20” |
| Thickness | 0.125”, 0.25” | |
Magnesium Oxide Sputtering Target Features
- High Purity: Typically available in 99.9% to 99.99% purity grades for high-quality film deposition.
- Excellent Dielectric Properties: Provides superior electrical insulation in thin film form.
- High Thermal & Chemical Stability: Resists degradation under extreme temperatures and harsh environments.
- Optical Transparency: Films are transparent in the visible and UV spectrum.
- Key Application: Primarily used as a protective layer in Plasma Display Panels (PDPs).
- Specialized Deposition: Requires RF sputtering due to its insulating nature.
- Superior Film Morphology: Produces dense, smooth, and stoichiometric thin films.
Magnesium Oxide Sputtering Target Applications
- Plasma Display Panels (PDPs): As a primary protective layer to enhance efficiency and lifespan.
- Magnetic Tunnel Junctions (MTJs): As a tunnel barrier layer in spintronic devices and MRAM.
- Superconducting Devices: As an insulating buffer layer in Josephson junctions and thin-film superconductors.
- Optical Coatings: As a high-index material for anti-reflection coatings and multilayer optical filters.
- Semiconductor & Electronics: As a gate dielectric or protective insulating layer in specialized thin-film devices.
- Protective & Functional Films: For corrosion-resistant, wear-resistant, or diffusion barrier coatings.
Magnesium Oxide Ceramic Packaging
Magnesium oxide ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of products in their original condition.
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- SAFETY DATA SHEET (SDS) -Magnesium Oxide Sputtering Target
FAQ
What is a Magnesium Oxide Sputtering Target, and what are its main applications?
A Magnesium Oxide Sputtering Target is a high-purity ceramic material used in Physical Vapor Deposition (PVD) to deposit MgO thin films. It is primarily applied in Plasma Display Panel (PDP) protective layers, Magnetic Tunnel Junctions (MTJ), optical coatings, and high-temperature superconducting devices.
Why is RF sputtering typically used for MgO targets instead of DC sputtering?
MgO is an insulating material. DC sputtering can cause charge accumulation and arcing. RF sputtering uses a high-frequency alternating field to prevent charge buildup, making it suitable for depositing insulating dielectric films.
What is the standard purity of MgO sputtering targets, and how do I choose?
For industrial applications, 99.9% (3N) purity is common. For advanced R&D or semiconductor uses, 99.99% (4N) or higher purity is recommended to ensure film performance and consistency.
What are the key properties of MgO thin films?
High dielectric constant, excellent electrical insulation, good optical transparency (especially in UV range), high chemical stability, and resistance to plasma erosion.
What are the advantages of MgO targets compared to Alumina (Al₂O₃) targets?
MgO offers a higher dielectric constant, better secondary electron emission coefficient (ideal for PDPs), superior UV optical properties, and higher thermal stability compared to alumina.
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