Boron Carbide Sputtering Target

Boron Carbide Sputtering Target is made from high-purity boron carbide, featuring high hardness, wear resistance, and excellent chemical stability. It is suitable for preparing wear-resistant coatings and semiconductor films, widely used in electronics and aerospace fields to ensure film uniformity and performance. NexusX Advanced Materials, as a premier manufacturer and supplier of high-quality boron carbide products, focuses on producing high-precision boron carbide sputtering targets for diverse application fields.

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Boron Carbide Sputtering Target Data Sheet

Purity:	99.5%
CAS:	12069-32-8
Apparence	Black or grey, Crystalline Solid
Chemical Formula:	B₄C
Molar Mass:	55.255 g/mol
Density:	2.52 g/cm³
Melting Point:	2,763 °C (5,005 °F; 3,036 K)
Boiling Point:	3,500 °C (6,330 °F; 3,770 K)
shape:	Rectangular, Disc, Tube
Bonding Service	Unbonding or Bonding

Boron Carbide Sputtering Target Description

Boron carbide sputtering targets are high-performance functional materials crafted from ultra-high-purity boron carbide powder via advanced sintering techniques, boasting exceptional properties like ultra-high hardness (second only to diamond and cubic boron nitride), strong wear resistance, and outstanding chemical inertness that resists corrosion from most acids and alkalis. Widely applied in sputtering deposition processes, they are key for fabricating wear-resistant protective coatings, semiconductor functional films, and neutron-shielding thin layers; ideal for electronics, aerospace, and nuclear industries, these targets ensure uniform film thickness and stable performance to meet strict requirements for high-precision thin-film applications.

Boron Carbide Sputtering Target Specifications

Circular Sputtering Targets	Diameter	1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ up to 21″
Rectangular Sputtering Targets	Width x Length	5″ x 12″, 5″ x 15″, 5″ x 20″, 5″ x 22″, 6″ x 20″
Thickness		1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ up to 21″

Boron Carbide Sputtering Target Features

Exceptional Hardness: Possesses ultra-high hardness, ranking only behind diamond and cubic boron nitride, enabling the deposition of ultra-wear-resistant thin films.
Superior Wear & Corrosion Resistance: Exhibits strong wear resistance and excellent chemical inertness, resisting erosion from most acids, alkalis, and harsh environments.
High Purity & Uniformity: Crafted from ultra-high-purity boron carbide powder via advanced sintering, ensuring low impurity content and uniform microstructure for consistent sputtering performance.
Stable Sputtering Performance: Maintains stable discharge and deposition rate during sputtering, guaranteeing uniform thickness and reliable quality of the prepared thin films.
Broad Environmental Adaptability: Performs well in extreme conditions like high temperatures and high vacuum, suitable for diverse industrial sputtering scenarios.

Boron Carbide Sputtering Target Applications

Nuclear Radiation Shielding: Used in the fabrication of thin films for neutron-absorbing barriers in nuclear reactors.
Control Rod Coatings: Applied to create surface layers in control rods, enhancing neutron absorption efficiency.
Shutdown Pellet Films: Utilized in thin films for emergency shutdown systems in nuclear facilities.
Protective Optical Coatings: Used in optics where high hardness and radiation resistance are required.
Semiconductor Components: Suitable for producing hard, chemically stable layers in semiconductor processing.

Boron Carbide Ceramic Packaging

Boron Carbide ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of products in their original condition.

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FAQ

What core raw material and manufacturing process are used for boron carbide sputtering targets?

They are mainly made from ultra-high-purity boron carbide powder (purity often ≥99.5%), processed via advanced sintering techniques (e.g., hot pressing sintering) to achieve dense, uniform microstructures suitable for sputtering.

Why is boron carbide sputtering target preferred for wear-resistant coating preparation?

It has ultra-high hardness (second only to diamond and cubic boron nitride) and strong wear resistance, ensuring the deposited coatings can withstand long-term friction and mechanical impact in harsh environments.

Can boron carbide sputtering targets resist chemical corrosion? What practical value does this have?

Yes, they have excellent chemical inertness and can resist corrosion from most acids, alkalis, and organic solvents. This makes them ideal for fabricating protective films in chemical equipment, semiconductor etching chambers, and other corrosion-prone scenarios.

What industries rely heavily on boron carbide sputtering targets, and for what specific applications?

Key industries include electronics (for semiconductor functional films), aerospace (for wear-resistant coatings on engine parts), and nuclear energy (for neutron-shielding thin layers in reactors), addressing high-performance material needs in these fields.

How does the purity of boron carbide sputtering targets affect sputtering results?

Low impurity content (from high-purity raw materials) avoids introducing foreign particles into the deposited films, ensuring stable sputtering discharge, uniform film thickness, and reliable electrical/mechanical properties of the final films.

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