Quartz Ring For Etching Equipment
The Quartz Ring for Etching Equipment is a critical ceramic component in semiconductor dry etching tools, manufactured from high-purity synthetic quartz and installed around the wafer edge within the etching chamber. Its primary functions are to focus and confine the plasma for uniform etching while protecting the electrostatic chuck and chamber walls from corrosive plasma erosion. With exceptional thermal resistance, chemical stability, and low thermal expansion coefficient, the quartz ring withstands extreme process environments. It serves as a core consumable for maintaining etching process stability and cleanliness, widely used in advanced semiconductor manufacturing such as logic chips and memory devices.
- Custom and standard options available.
- Fast lead times guaranteed.
- High performance at a competitive price.
Quartz Ring For Etching Equipment Data Sheet
| Color: | White – transparent |
| Dimension(inch): | 2, 4, or customized |
| Outer Dimeter(mm): | 50.8, 101.6 or customized |
| Thickness(mm): | 3, 4, or customized |
| Purity: | 99.99% |
Quartz Ring For Etching Equipment Description
Crafted from ultra-high-purity synthetic quartz, our Quartz Ring for Etching Equipment is a precision-engineered consumable component designed for advanced semiconductor dry etch chambers. It is meticulously shaped to ensure a perfect fit within specific OEM tool platforms, where it acts as a critical plasma confinement ring positioned around the wafer periphery. Its primary function is to focus and homogenize the plasma discharge directly over the substrate, enabling superior etch uniformity and repeatability across the entire wafer surface. Simultaneously, it serves as a robust protective barrier, shielding the sensitive electrostatic chuck and chamber walls from aggressive etching species, thereby extending the service life of these high-value components. Engineered for exceptional chemical inertness, thermal stability, and low particulate generation, this quartz ring maintains process integrity in corrosive halogen-based (fluorine/chlorine) plasma environments at elevated temperatures. It is an essential consumable for achieving high yields and consistent performance in the fabrication of logic devices, memory chips (DRAM, 3D NAND), and advanced packaging, delivering outstanding reliability and cost-of-ownership benefits for your most demanding etching applications.
Quartz Ring For Etching Equipment Features
- Material: Made from ultra-high-purity, synthetic quartz.
- Function: Acts as a plasma confinement and focusing ring.
- Primary Benefit: Ensures uniform and repeatable etching.
- Protective Role: Shields the electrostatic chuck and chamber walls from corrosion.
- Stability: Excellent chemical inertness and thermal stability in harsh plasmas.
- Cleanliness: Low particulate generation for high process purity.
- Application: Critical consumable for advanced semiconductor fabrication (e.g., logic, memory).
- Customization: Precisely engineered to fit specific OEM tool platforms.
Quartz Ring For Etching Equipment Applications
- Logic Chip Manufacturing: Used in etching critical features for advanced logic processors (e.g., FinFETs, GAA transistors).
- Memory Production: Essential for patterning in DRAM and 3D NAND flash memory fabrication.
- Advanced Packaging: Employed in processes like TSV (Through-Silicon Via) etching for 2.5D/3D IC integration.
- Power Device Fabrication: Used in manufacturing power semiconductors (e.g., SiC, GaN devices).
- Dielectric Etching: Applied in etching silicon dioxide, silicon nitride, and low-k dielectric films.
- Conductor Etching: Used in patterning polysilicon gates and metal interconnects.
- CMOS Image Sensor Manufacturing: Involved in creating microstructures for sensor pixels.
Quartz Ceramic Material Properties
| Purity (%) | >99.8 | >99.5 |
| Density (g/cm3) | 1.9-1.95 | 1.9-1.95 |
| Flexture strength (MPa) | 28 | 28 |
| Compressive strength (MPa) | >50 | >50 |
| Bending strength (MPa) | 25 | 25 |
| Maximum working temperature (℃) | 1650 | 1650 |
| Thermal conductivity (W/m*K) | <1 | <1 |
| Thermal expansion coefficient (/℃) | 8.5*10-7 | 8.5*10-7 |
| number of use | ≥10 | ≥10 |
Quartz Ceramic Packaging
Quartz ceramic products are typically packaged in vacuum-sealed bags to prevent moisture or contamination and wrapped with foam to cushion vibrations and impacts during transport, ensuring the quality of products in their original condition.
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- SAFETY DATA SHEET (SDS) -Quartz Ring For Etching Equipment
FAQ
What is the function of a Quartz Ring in etching equipment?
It is a core consumable that confines and focuses plasma for uniform wafer etching while protecting the electrostatic chuck and chamber walls from corrosion.
What material is the Quartz Ring typically made of?
It is made of high-purity synthetic quartz, ensuring excellent chemical inertness, thermal stability, and very low metallic impurity levels.
How does the Quartz Ring affect etching process uniformity?
Its precise design controls plasma distribution at the wafer edge, making it a key component for achieving uniform etch rates across the entire wafer.
What precautions should be taken when installing a Quartz Ring?
Handle in a cleanroom with gloves. Ensure precise, stress-free installation without particulate contamination, following standard operating procedures.
How can I tell if a Quartz Ring needs to be replaced?
Monitor for process drift (e.g., uniformity degradation), increased particle counts from the tool, and perform regular visual inspections for severe surface roughness, discoloration, or cracks.
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